A self - consistent model of helicon discharge
نویسندگان
چکیده
vi Chapter
منابع مشابه
Upper Limit to Landau Damping in Helicon Discharges
The uncommonly high rf absorption efficiency of helicon discharges has been thought to be caused by Landau damping of helicon waves and the concomitant acceleration of primary electrons. By constructing an energy analyzer that accounts for rf fluctuations in plasma potential, it is shown that Landau-accelerated electrons are too sparse to explain the ionization efficiency. Instead, rf absorptio...
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Radio frequency (rf) plasma sources used in the processing of thin films can be divided into three distinct categories: capacitive (E), inductive (H), and wave (W) -sustained (e.g., helicon) discharges. As the excitation power or voltage is increased, transitions from capacitive to inductive to helicon discharges are often observed, in some cases exhibiting hysteresis. A model is developed to d...
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تاریخ انتشار 2008